극자외선 리소그래피: 마이크로칩 제조의 한계를 뛰어넘다 ２부 중 ２부

In the coming years, the application of microchips will continue to expand, the demand for chips will also continue to grow. However, the traditional 193 nm lithography has reached its limit and must be replaced with its 13.5 nm EUV counterpart. It is generally agreed that EUV lithography is the most difficult technology to perfect in the history of the semiconductor industry — so challenging that it is comparable to NASA’s Moon landing project.